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The Geisha Chilena And Her. in porno latino. video anita alvarado la geisha chilena por delante en la verga – Los videos de mujer.The invention relates to a process for treating contaminated gas to remove odorous constituents.
In particular, the invention relates to a process for treating gas contaminated with, for example, components that may be used to protect skins from irritation by vapours of human origin, or components that may be used to make solid skin components adhere to human skin.
The invention is particularly applicable to the treatment of toxic and irritant gases such as those that may be emitted by any of various industrial processes that may discharge such gases into the atmosphere.
Particularly, the invention relates to a process for removing odorous constituents from gas to give a gas containing the removed constituents, said process comprising the steps of:
admixture of a bulk sorbent substance, which comprises an adsorbent which is able to adsorb said constituents by absorption in the bulk of the substance, in a reaction vessel, under conditions which allow the adsorbent to be adsorbed on the constituents; PA1 a separation stage in which the adsorbed constituents are desorbed from the adsorbent; PA1 removal of the desorbed constituents by a suitable method for atmospheric disposal; PA1 introduction of an essentially pure gas into the reaction vessel, said introduction comprising an amount of gas that is lower than the amount of sorbent substance previously introduced into said vessel; and PA1 removal of excess sorbent substance. PA1 introduction of a desorption gas, which has passed through the reaction vessel containing sorbent material which comprises an adsorbent able to adsorb said constituents, into a second reaction vessel, under conditions which allow the desorption gas to be adsorbed on the constituents.
FR-A-2,640,659 describes a process of this type which involves several stages, in which the admixture reaction vessel is separated by a solid phase from the separation vessel and the product is removed by a desorption gas from the desorption vessel. The regeneration and removal of sorbent is done in several phases, including a stage in which the sorbent removed from the reaction vessel is further treated by a desorption gas.
With this known process, the reaction vessel is located downstream of the desorption vessel, so that the gas used to desorb the contaminants is the residue after the purification processes, i.

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